PPMS
 
   


 
"REACHING TRENDS IN PLASMA PROCESSING SCIENCE"
RACORD
ro

 

Research contract no.: CEEX-05-D11-13
Project coordinator:
National Institute for Laser, Plasma and Radiation Physics
Project manager:
Dr. Gheorghe Dinescu, CS I, e-mail: dinescug@infim.ro

 

Institutions involved in the project:

1. National Institute for Lasers, Plasma and Radiation Physics (NILPRP)
Low Temperature Plasma Laboratory
Plasma Processes for Funtional Materials and Surfaces
Dr. Gheorghe Dinescu, CS I, e-mail: dinescug@infim.ro

2. Research - Development National Institute for Physics of Materials (NIPM)
Defects of Microstructures in Solid Materials
Dr. Leona Nistor, CS I, e-mail: leonis@infim.ro

3. Research - Development National Institute for Optic Electronics (INOE 2000)
Advanced Surface Processing and Analysis by Vacuum Technologies
Dr. Viorel Braic, e-mail: vbraic@inoe.inoe.ro

4. Horia Hulubei National Institute of Physics and Nuclear Engineering (IFIN-HH)
Department of Nuclear Physics
Dr. Nicolae Victor Zamfir, e-mail: dirgen@ifin.nipne.ro

5. Faculty of Physics - University of Bucharest (FF-UB)
The Department of Atomic and Nuclear Physics
Re. Bercu Mircea, e-mail: mbercu@olimp.unibuc.ro
Department of Mechanics, Molecular Physics and Physics of Polymers
Re. Dr. Emil Stefan Barna, e-mail: emil.barna@unibuc.ro

6. Petroleum - Gas University of Ploiesti (GUP)
Faculty of Physics
Re. Dr. Fiz. Grigore Ruxanda, e-mail: gruxanda@upg-ploiesti.ro
Faculty of Petroleum and Petrochemistry
Faculty of Chemistry
Dr. Dragos Ciupariu, e-mail: dciuparu@mail.upg-ploiesti.ro

7. C. ZECASIN s.a.
Dr. Ruxandra Birjega, e-mail: ruxandra.birjega@inflpr.ro

 

General objectives of the project

1. Elaboration of new plasma systems for material processing (atmospheric pressure, combined):
a) realization and demonstration of a plasma system based on atmospheric discharge for deposition / cleaning of surfaces;
b) assessment of the synergistic effect of combined plasma techniques at atmospheric pressure (laser plasma an RF palsma) in deposition of improved quality thin films ant etching.

2. Functionalization of surfaces / deposition of thin polymeric films requied for adhesivity control and selective interaction:
a) to promote selective chemical interactions;
b) controlled adherence.

3. Plasma stimulated growth of nanostructured materials on catalytic nano-porous templates and powder production and treatment in plasma:
a) develop a process and explain whether Plasma Enchanced CVD is beneficial for growth (rate, nanostrctured properties) as compared with CVD only;
b) develop an assess plasma systems for powder production / powder functionalization.

4. Plasma process for stimuli / responsive filtration system based on polymeric nuclear track membranes:
a) imagine and assess the effectiveness of a plasma solution for modifying porous materials, like track membranes, inside channels with small dimension, even in the sub-micrometric range .

 

Persons involved in the project:

Senior scientist 
PhD students
Youth under 35 years
CS1 or equivalent 
CS2 or equivalent
CS3 or equivalent 
CS or equivalent 
Unascertained persons 
12
9
17
10
5
5
10
19

 

 

 

 

 
             
Plasma Processes, Materials and Surfaces Group